Study on absorbance and laser damage threshold of HfO2 films prepared by ion-assisted reaction deposition
Using a new kind of EH1000 ion source, hafnium dioxide (HfO2) films are deposited with different depo sition techniques and different conditions. The absorbance and the laser damage threshold of these films have been measured and studied. By comparing these characteristics, one can conclude that under right conditions, such as high partial pressure of oxygen and right kind of ion source, the ion-assisted reaction deposition can prepare HfO2 films with higher laser induced damage threshold.
作 者： 张大伟 范树海 高卫东 贺洪波 王英剑 邵建达 范正修 孙浩杰 作者单位： 张大伟,范树海,高卫东,贺洪波,王英剑,邵建达,范正修(R&D Center for Optical Thin Film Coatings, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800)孙浩杰(Qufu First High School, Qufu 273100)
刊 名： 激光与光电子学进展 ISTIC PKU 英文刊名： CHINESE OPTICS LETTERS 年，卷(期)： 2004 2(5) 分类号： 关键词：