Study for infrared spectroscopic ellipsometric properties of diamond films
Spectroscopic ellipsometric measurements in infrared region (2.5 - 12.5 μm) are carried out to characterize the structure and quality of diamond films grown by microwave plasma chemical vapor deposition (MPCVD) and hot filament chemical vapor deposition (HFCVD), respectively. It is found that the establishnent of appropriate models has the strongest influence on the fit of ellipsometric spectra. The best fit is achieved for MPCVD film with a 77.5-nm middle layer of SiO2, and for HFCVD film with an 879-nm rough surface layer included by Bruggeman effective medium approtimation (EMA). Finally the refractive index and the extinction coefficient are calculated for both films, the results show that the film grown by MPCVD is optically much better than that grown by HFCVD at infrared wavelengths.
作 者： 王林军 夏义本 沈沪江 张明龙 杨莹 汪琳 作者单位： School of Materials Science ＆ Engineering, Shanghai University, Shanghai 201800 刊 名： 激光与光电子学进展 ISTIC PKU 英文刊名： CHINESE OPTICS LETTERS 年，卷(期)： 2004 2(5) 分类号： 关键词：